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Ver Investigador - - Prisma - Unidad de Bibliometría

Rafael Alvarez Molina

Profesor Titular de Universidad
ralvarezmol@us.es
Área de conocimiento: Física Aplicada
Departamento: Física Aplicada I
Grupo: Nanotecnología en Superficies y Plasma - FQM-196 (Universidad de Sevilla)
Centro mixto: Instituto Ciencia de los Materiales (ICMSE)

Investiga en

Palabras clave
Líneas de investigación
Resumen
Tipo Año Título Fuente
Artículo2024 Growth dynamics of nanocolumnar thin films deposited by magnetron sputtering at oblique angles. NANOTECHNOLOGY
Artículo2023 Low temperature nucleation of thermochromic VO2crystal domains in nanocolumnar porous thin films NANOTECHNOLOGY
Artículo2023 Plasmas and acoustic waves to pattern the nanostructure and chemistry of thin films ACTA MATERIALIA
Artículo2023 Structure and void connectivity in nanocolumnar thin films grown by magnetron sputtering at oblique angles COATINGS
Artículo2022 Compositional gradients at the nanoscale in substoichiometric thin films deposited by magnetron sputtering at oblique angles: a case study on SiOx thin films PLASMA PROCESSES AND POLYMERS
Artículo2022 Thin film nanostructuring at oblique angles by substrate patterning SURFACE & COATINGS TECHNOLOGY
Capítulo2021 Deposition of porous nanocolumnar thin films by magnetron sputtering Plasma Applications for Material Modification
Editorial2021 Editorial for special issue: Nanostructured surfaces and thin films synthesis by physical vapor deposition NANOMATERIALS
Artículo2021 Electrical and reaction performances of packed-bed plasma reactors moderated with ferroelectric or dielectric materials PLASMA PROCESSES AND POLYMERS
Artículo2021 Electrochromic response and porous structure of WO3 cathode layers ELECTROCHIMICA ACTA
Libro2021 Nanostructured surfaces and thin films synthesis by physical vapor deposition Nanostructured Surfaces and Thin Films Synthesis by Physical Vapor Deposition
Artículo2021 Patterning and control of the nanostructure in plasma thin films with acoustic waves: mechanical vs. electrical polarization effects Materials Horizons
Artículo2020 A 4-view imaging to reveal microstructural differences in obliquely sputter-deposited tungsten films MATERIALS LETTERS
Artículo2020 Positron annihilation analysis of nanopores and growth mechanism of oblique angle evaporated TiO2 and SiO2 thin films and multilayers MICROPOROUS AND MESOPOROUS MATERIALS
Capítulo2020 Una metodología investigativa para enseñar Magnetostática Ciclos de mejora en el aula, año 2019: experiencias de innovación docente de la Universidad de Sevilla
Artículo2020 Wetting and spreading of liquid lithium onto nanocolumnar tungsten coatings tailored through the topography of stainless steel substrates NUCLEAR FUSION
Artículo2019 2D compositional self-patterning in magnetron sputtered thin films APPLIED SURFACE SCIENCE
Artículo2019 Antibacterial nanostructured Ti coatings by magnetron sputtering: From laboratory scales to industrial reactors NANOMATERIALS
Artículo2019 Environmentally tight TiO2-SiO2 porous 1D-photonic structures ADVANCED MATERIALS INTERFACES
Artículo2019 Growth of nanocolumnar thin films on patterned substrates at oblique angles PLASMA PROCESSES AND POLYMERS
Artículo2019 Kinetic energy-induced growth regimes of nanocolumnar Ti thin films deposited by evaporation and magnetron sputtering NANOTECHNOLOGY
Artículo2019 SiOx by magnetron sputtered revisited: tailoring the photonic properties of multilayers APPLIED SURFACE SCIENCE
Artículo2018 Growth of nanocolumnar porous TiO2 thin films by magnetron sputtering using particle collimators SURFACE & COATINGS TECHNOLOGY
Artículo2017 Cholesterol biosensing with a polydopamine-modified nanostructured platinum electrode prepared by oblique angle physical vacuum deposition SENSORS AND ACTUATORS B-CHEMICAL
Artículo2017 Fabrication of black-gold coatings by glancing angle deposition with sputtering BEILSTEIN JOURNAL OF NANOTECHNOLOGY
Artículo2017 Micron-scale wedge thin films prepared by plasma enhanced chemical vapor deposition PLASMA PROCESSES AND POLYMERS
Artículo2017 Structural control in porous/compact multilayer systems grown by magnetron sputtering NANOTECHNOLOGY
Artículo2016 High-rate deposition of stoichiometric compounds by reactive magnetron sputtering at oblique angles PLASMA PROCESSES AND POLYMERS
Artículo2016 Nanocolumnar association and domain formation in porous thin films grown by evaporation at oblique angles NANOTECHNOLOGY
Artículo2016 Stoichiometric control of SiOx thin films grown by reactive magnetron sputtering at oblique angles PLASMA PROCESSES AND POLYMERS
Artículo2015 Modulating low energy ion plasma fluxes for the growth of nanoporous thin films PLASMA PROCESSES AND POLYMERS
Artículo2015 Nanocolumnar coatings with selective behavior towards osteoblast and Staphylococcus aureus proliferation ACTA BIOMATERIALIA
Artículo2015 Nanostructured Ti thin films by magnetron sputtering at oblique angles JOURNAL OF PHYSICS D-APPLIED PHYSICS
Artículo2014 Interpretation of electron Rutherford backscattering spectrometry for hydrogen quantification SURFACE AND INTERFACE ANALYSIS
Artículo2014 Nanocolumnar growth of thin films deposited at oblique angles: beyond the tangent rule JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
Artículo2014 On the deposition rates of magnetron sputtered thin films at oblique angles PLASMA PROCESSES AND POLYMERS
Artículo2014 On the formation of the porous structure in nanostructured a-Si coatings deposited by DC magnetron sputtering at oblique angles NANOTECHNOLOGY
Artículo2014 On the kinetic and thermodynamic electron temperatures in non-thermal plasmas EPL
Artículo2013 Atomistic model of ultra-smooth amorphous thin film growth by low-energy ion-assisted physical vapour deposition JOURNAL OF PHYSICS D-APPLIED PHYSICS
Artículo2013 Growth of silver on ZnO and SnO 2 thin films intended for low emissivity applications APPLIED SURFACE SCIENCE
Artículo2013 Growth of SiO2 and TiO2 thin films deposited by reactive magnetron sputtering and PECVD by the incorporation of non-directional deposition fluxes PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE
Artículo2013 Growth regimes of porous gold thin films deposited by magnetron sputtering at oblique incidence: from compact to columnar microstructures NANOTECHNOLOGY
Artículo2012 Critical thickness and nanoporosity of TiO2 optical thin films MICROPOROUS AND MESOPOROUS MATERIALS
Artículo2012 Following the wetting of one-dimensional photoactive surfaces LANGMUIR
Artículo2012 Influence of plasma-generated negative oxygen ion impingement on magnetron sputtered amorphous SiO2 thin films during growth at low temperatures JOURNAL OF APPLIED PHYSICS
Artículo2012 Roughness assessment and wetting behavior of fluorocarbon surfaces JOURNAL OF COLLOID AND INTERFACE SCIENCE
Revisión2011 Comments on "an essay on contact angle measurements": Determination of surface roughness and modeling of the wetting behavior PLASMA PROCESSES AND POLYMERS
Artículo2011 Theoretical and experimental characterization of TiO2 thin films deposited at oblique angles JOURNAL OF PHYSICS D-APPLIED PHYSICS
Ponencia2010 Electromagnetic modeling of axis-symmetric microwave devices THIRD INTERNATIONAL WORKSHOP AND SUMMER SCHOOL ON PLASMA PHYSICS 2008
Artículo2010 Morphological evolution of pulsed laser deposited ZrO2 thin films JOURNAL OF APPLIED PHYSICS
Artículo2010 On the microstructure of thin films grown by an isotropically directed deposition flux JOURNAL OF APPLIED PHYSICS
Artículo2010 Tilt angle control of nanocolumns grown by glancing angle sputtering at variable argon pressures APPLIED PHYSICS LETTERS
Artículo2009 Modeling of an axial injection torch EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS
Artículo2008 Images of the electromagnetic-field distribution in a microwave reactor excited by an axial injection torch IEEE TRANSACTIONS ON PLASMA SCIENCE
Artículo2008 Numerical solution to an electromagnetic model with Neumann boundary conditions, for a microwave-driven plasma reactor JOURNAL OF PHYSICS D-APPLIED PHYSICS
Artículo2007 Two-dimensional electromagnetic model of a microwave plasma reactor operated by an axial injection torch JOURNAL OF APPLIED PHYSICS
Ponencia2006 The Stark-crossing method for the simultaneous determination of the electron temperature and density in plasmas FIRST INTERNATIONAL WORKSHOP AND SUMMER SCHOOL ON PLASMA PHYSICS
Artículo2005 Radial description of excitation processes of molecular and atomic species in a high-pressure helium microwave plasma torch JOURNAL OF PHYSICS D-APPLIED PHYSICS
Artículo2005 The effect of the gas flow-rate on the radial structure of a torch-like helium plasma IEEE TRANSACTIONS ON PLASMA SCIENCE
Artículo2005 Thermal inequilibrium of atmospheric helium microwave plasma produced by an axial injection torch JOURNAL OF APPLIED PHYSICS
Ponencia2004 Comparison of three different methods for the obtention of the electron density radial distribution in a discharge with axial symmetry Institute of physics conference series
Artículo2004 Radial distribution of electron density, gas temperature and air species in a torch kind helium plasma produced at atmospheric pressure SPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY
Artículo2004 Radial study of atomic and ionic argon species in the helium-argon microwave plasma produced by the axial injection torch Acta Physica Slovaca
Artículo2004 Removal of volatile organic compounds by a high pressure microwave plasma torch Acta Physica Slovaca
Artículo2004 Spectroscopic study of a helium microwave discharge produced by the axial injection torch. High Temperature Material Processes
Artículo2002 An Abel inversion method for radially resolved measurements in the axial injection torch SPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY
Artículo2000 Radial characterisation of the helium plasma produced by the Axial Injection Torch (TIA) at atmospheric pressure CZECHOSLOVAK JOURNAL OF PHYSICS
Artículo2000 The electron temperature determination in a non-equilibrium helium plasma induced by microwave CZECHOSLOVAK JOURNAL OF PHYSICS
Este investigador no ha dirigido/tutorizado tesis

Proyectos de Investigación

Fecha de inicio Fecha de fin Rol Denominación Agencia financiadora
01/01/2021 31/05/2023 Investigador/a Plasmas atmosféricos de arco deslizante para la producción sostenible de amoniaco e hidrógeno (ARCPLAS) (US-1380977) Consejería de Economía, Conocimiento, Empresas y Universidad (Autonómico)
01/12/2022 31/05/2025 Investigador/a Desarrollo de plasmas intermitentes operados con electricidad renovable para la eliminación y revalorización de CO2 (TED2021-130124A-I00) Ministerio de Ciencia e Innovación (Nacional)
01/01/2021 31/05/2023 Investigador/a Funcionalización superficial y modelos de difusión de factores de germinación en semillas tratadas con plasmas - PLASMASEED (US-1381045) Consejería de Economía, Conocimiento, Empresas y Universidad (Autonómico)

Patentes

Nº Solicitud Fecha Solicitud Fecha Concesión Nombre
P201531939 30/12/2015 17/04/2018 Procedimiento de deposición de capas delgadas de estequiometría controlada sobre sustratos mediante pulverización catódica reactiva a ángulo rasante